Axcelis' high current implant product line covers the entire spectrum of high dose ion implant applications, including planar and 3D devices.  All of our products are designed to provide you the highest level of productivity with the lowest cost of ownership. In addition, they provide maximum process versatility and extendibility to future technology nodes, to optimize the return on your equipment investment.

  • Purion H:  Axcelis’ next generation high current implanter, the Purion H provides customers with an unprecedented level of process flexibility to address the modern challenges of the transition to 3D devices.  It features proprietary, common Purion platform technology designed with customer’s requirements for more precise dopant placement, enhanced electrical performance and better yield.
  • Optima HDx:  The system provides solutions for high dose and damage engineering applications. The innovative scanned spot beam technology ensures the highest instantaneous dose rate, shown to reduce the implant damage profile and enhance device performance.