1996
- GSD/200E2 introduced. This is still being sold today as the GSD Ovation, which was relaunched in 2021
- One of the bigger process challenges in this era was charge control, as the gate oxide thickness was such that it was very sensitive to charge breakdown. As a result, Eaton introduced the back biased Secondary Electron Flood (SEF) to provide charge control with low risk of emitting high energy primary electrons
- 8200P mid current implanter introduced, featuring innovative parallel scanning beam
